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[Analysis Case] Quantification of Interstitial Atom Concentration in Silicon Single Crystals

[Analysis Case] Quantification of Interstitial Atom Concentration in Silicon Single Crystals

Quantitative analysis of interstitial oxygen and carbon concentration non-destructively using infrared absorption method.

It is possible to non-destructively determine the interstitial oxygen and carbon atom concentrations in silicon single crystals using FT-IR analysis. The concentrations are calculated from the peak heights of the absorption due to interstitial oxygen or carbon in the spectra measured by the transmission method. The calculation method is standardized by the Japan Electronics and Information Technology Industries Association (JEITA). Below are examples of calculated interstitial oxygen atom concentrations.

  • Contract Analysis

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Quantification of Hydrogen Bonding States in SiN Films

Quantification of Hydrogen Bonding States in SiN Films

Quantification of Si-H and N-H in SiN films using infrared absorption method.

It is possible to determine the concentrations of Si-H and N-H in SiN films through FT-IR analysis. Although it is also possible to determine hydrogen concentration using analyses such as SIMS, this provides the total hydrogen concentration and does not allow for the separate determination of hydrogen bonded to Si and hydrogen bonded to N. In FT-IR, the Si-H stretching vibration and N-H stretching vibration have peaks at different positions, allowing us to use these peaks to determine the respective hydrogen concentrations. Below are examples of analyses that determined the concentrations of Si-H and N-H in SiN films on Si substrates.

  • Contract Analysis

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